Plasma processing apparatus and plasma processing method

ABSTRACT

In a plasma processing apparatus for plasma-processing a silicon wafer  6  to which a protective film  6   a  is stuck in a state that the silicon wafer  6  is held by a first electrode  3  by electrostatic absorption and is being cooled, the top surface  3   g  of the first electrode  3  consists of a top surface central area A that is inside a boundary line P 2  that is distant inward by a prescribed length from the outer periphery P 1  of the silicon wafer  6  and in which the conductor is exposed, and a ring-shaped top surface peripheral area B that surrounds the top surface central area A and in which the conductor is covered with an insulating coating  3   f . This structure makes it possible to hold the silicon wafer  6  by sufficient electrostatic holding force by bringing the silicon wafer  6  into direct contact with the conductor and to increase the cooling efficiency by virtue of heat conduction from the silicon wafer  6  to the first electrode  3.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a division of U.S. patent application Ser. No.10/621,497 filed Jul. 17, 2003.

BACKGROUND OF THE INVENTION

The present invention relates to a plasma processing apparatus and aplasma processing method for plasma-processing a semiconductor substratesuch as a silicon wafer.

In manufacturing processes of silicon wafers for semiconductor devices,thinning processing for decreasing the thickness of a substrate has cometo be performed increasingly as the thickness of semiconductor deviceshas decreased. In the thinning processing, after formation of circuitpatterns on the front surface of a silicon substrate, the back surface,that is, the surface opposite to the circuit formation surface, isground mechanically. After the mechanical grinding, plasma processing isperformed to etch away a damaged layer that has been formed on theground surface of the silicon substrate by the grinding.

In the plasma processing, the silicon wafer is held in a state that itscircuit formation surface faces the mounting surface of a substratemounting portion because the processing subject surface (i.e., backsurface) of the silicon wafer needs to be located above. To prevent thecircuits from directly touching the mounting surface and thereby beingdamaged, a protective film is stuck to the circuit formation surface.

One method for holding such a silicon wafer is a method utilizingelectrostatic absorption. In this method, a silicon wafer is placed on asubstrate mounting portion in which the surface of a conductor iscovered with a thin insulating layer. A DC voltage is applied to theconductor to make the surface of the substrate mounting portion anelectrostatic absorption surface. The silicon wafer is held by thesubstrate mounting portion by Coulomb force that acts between thesilicon wafer and the conductor that is located under the insulatinglayer.

However, where a silicon wafer to which a protective film (mentionedabove) is stuck is held by electrostatic absorption, the Coulomb forceacts on the conductor via not only the insulating layer but also theinsulative protective film and hence the electrostatic absorption forceis weaker than in a case that the silicon wafer is in direct contactwith the electrostatic absorption surface (i.e., without intervention ofa protective film); sufficient holding force may not be obtained.

Further, since the entire surface of the substrate mounting portion iscovered with the insulating layer, in a state that the silicon wafer ismounted thereon, the silicon wafer is not in direct contact with theconductor of the substrate mounting portion and hence the conductivityof heat from the silicon wafer to the substrate mounting portion is low.This makes it difficult to cool the silicon wafer by removing heat fromit efficiently during plasma processing. If the substrate temperatureincreases excessively, the protective film that is stuck to thesubstrate receives heat damage. In view of this, in setting plasmaprocessing conditions, the output power for plasma processing of a powersource needs to be set low, that is, the output power is restricted bythe substrate cooling ability of the substrate mounting portion. Asdescribed above, where the processing object is a semiconductorsubstrate having an insulating layer (protective film), it is difficultto increase the cooling efficiency while maintaining sufficientelectrostatic holding force; it is difficult to realize plasmaprocessing having a high etching rate.

SUMMARY OF THE INVENTION

An object of the present invention is therefore to provide a plasmaprocessing apparatus and a plasma processing method capable ofincreasing the cooling efficiency of a semiconductor substrate whileholding it by sufficient electrostatic holding force.

According to the first aspect of the invention, a plasma processingapparatus for plasma-processing a surface of a substrate having aninsulating layer on the front surface that is accommodated in aprocessing room, comprises: an electrode that is a conductor and has atop surface that is greater in external size than the substrate; coolingmeans for cooling the electrode; a DC power section for applying a DCvoltage to the electrode to cause the top surface of the electrode tohold the substrate by electrostatic absorption; pressure lowering meansfor lowering pressure inside the processing room; a plasma generationgas supply section for supplying a plasma generation gas to theprocessing room; and a radio-frequency power section for generatingplasma in the processing room by applying a radio-frequency voltage tothe electrode, wherein the top surface of the electrode has a topsurface central area that is inside a boundary line that is distantinward by a prescribed length from an outer periphery of the substrateand in which the conductor is exposed, and a ring-shaped top surfaceperipheral area that surrounds the top surface central area and in whichthe conductor is covered with an insulating coating.

Preferably, in the plasma processing apparatus, an outer peripheralportion of the insulating layer of the substrate being held by the topsurface of the electrode is in contact with the insulating coating in anarea between the outer periphery and the boundary line.

Preferably, the plasma processing apparatus further comprises aninsulating portion that covers an outer peripheral portion of theinsulating coating in ring form.

Preferably, in the plasma processing apparatus, the insulating coatingextends to cover part of a side surface of the electrode.

Preferably, in the plasma processing apparatus, the insulating coatingis made of alumina.

According to the second aspect of the invention, a plasma processingmethod in which an electrode that is a conductor and has a top surfacethat is greater in external size than a substrate to be plasma-processedthat has an insulating layer on a front surface thereof is provided in aprocessing room, the top surface of the electrode has a top surfacecentral area that is inside a boundary line that is distant inward by aprescribed length from an outer periphery of the substrate and in whichthe conductor is exposed and a ring-shaped top surface peripheral areathat surrounds the top surface central area and in which the conductoris covered with an insulating coating, and plasma processing isperformed in a state that the substrate is held by the top surface ofthe electrode by electrostatic absorption and the electrode is beingcooled, wherein the substrate is mounted on the top surface of theelectrode in such a manner that a central portion and a peripheralportion of the insulating layer of the substrate are in contact with thetop surface central area and the insulating coating in the top surfaceperipheral area, respectively; the substrate is electrostaticallyabsorbed on the top surface central area by mainly utilizing the centralportion of the insulating layer as a dielectric for electrostaticabsorption; and the top surface central area of the electrode isinsulated from plasma by bringing the outer peripheral portion of theinsulating layer into close contact with the insulating coating.

Preferably, in the plasma processing method, the substrate is asemiconductor substrate on the front surface of which logic circuits areformed, and a back surface of the semiconductor substrate is etched bythe plasma processing.

Preferably, in the plasma processing method, microcracks that havedeveloped on the back surface of the semiconductor substrate inmechanical processing are etched away.

According to the invention, the top surface of the electrode for holdinga substrate by electrostatic absorption consists of the top surfacecentral area that is inside the boundary line that is distant inward bya prescribed length from the outer periphery of the substrate and inwhich the conductor is exposed, and the ring-shaped top surfaceperipheral area that surrounds the top surface central area and in whichthe conductor is covered with the insulating coating. This structuremakes it possible to hold the substrate by sufficient electrostaticholding force and to increase the cooling efficiency of the substrate bybringing the substrate into close contact with the electrode.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a side sectional view of a plasma processing apparatusaccording to an embodiment of the invention;

FIG. 2 is a side sectional view of a first electrode of the processingapparatus according to the embodiment of the invention;

FIG. 3 is a side sectional view of the plasma processing apparatusaccording to the embodiment of the invention;

FIG. 4 is a side sectional view of the plasma processing apparatusaccording to the embodiment of the invention;

FIG. 5 is a horizontal sectional view of the plasma processing apparatusaccording to the embodiment of the invention;

FIG. 6 is a partial sectional view of the plasma processing apparatusaccording to the embodiment of the invention; and

FIGS. 7A and 7B are partial sectional view s of the plasma processingapparatus according to the embodiment of the invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

An embodiment of the present invention will be hereinafter describedwith reference to the drawings. FIG. 1 is a side sectional view of aplasma processing apparatus according to an embodiment of the invention.FIG. 2 is a side sectional view of a first electrode of the processingapparatus according to the embodiment of the invention. FIGS. 3 and 4are side sectional views of the plasma processing apparatus according tothe embodiment of the invention. FIG. 5 is a horizontal sectional viewof the plasma processing apparatus according to the embodiment of theinvention. FIGS. 6 and 7A and 7B are partial sectional views of theplasma processing apparatus according to the embodiment of theinvention.

First, the configuration of the plasma processing apparatus will bedescribed with reference to FIG. 1. As shown in FIG. 1, a processingroom 2 where to perform plasma processing is provided in a vacuumchamber 1; a closed processing space in which to generate plasma under alow pressure can be formed in the processing room 2. The processing room2 has a cylindrical shape (see FIG. 5), and a first electrode 3 and asecond electrode 4 are arranged in the vertical direction so as to beopposed to each other in the processing room 2. The first electrode 3and the second electrode 4 have cylindrical shapes and are arrangedconcentrically in the processing room 2.

The first electrode 3 is surrounded by two layers of insulators 5A and5B that are inserted to fill a bottom portion of the processing room 2,and is thereby fixed in such a manner that its top surface for holding aprocessing object is exposed at the center of the bottom of theprocessing room 2. The first electrode 3 is made of a conductivematerial such as aluminum, and has a structure that a support portion 3b extends downward from a disc-shaped electrode portion 3 a. The supportportion 3 b is held by the vacuum chamber 1 via an insulating member 5C,whereby the first electrode 3 is electrically insulated.

Like the first electrode 3, the second electrode 4 is made of aconductive material such as aluminum. The second electrode 4 has astructure that a support portion 4 b extends upward from a disc-shapedelectrode portion 4 a. The support portion 4 b is electricallycontinuous with the vacuum chamber 1. The second electrode 4 can beelevated and lowered by an elevation mechanism 24 (see FIG. 3). In astate that the second electrode 4 is lowered, the processing space ofthe processing room 2 is partitioned by the second electrode 4 into twospaces having different functions.

More specifically, a discharging space 2 b is formed under the secondelectrode 4, that is between the second electrode 4 and the firstelectrode 3 and an exhaust space 2 a is formed over the second electrode4, that is, between the second electrode 4 and the ceiling surface ofthe vacuum chamber 1. The discharging space 2 b is a space in whichplasma discharge is caused to perform plasma-processing on a siliconwafer 6 that is mounted on the first electrode 3. The exhaust space 2 ais a space through which to exhaust a gas from the discharging space 2b.

Next, the structure of the first electrode 3 will be described in detailwith reference to FIGS. 1 and 2. The top surface of the electrodeportion 3 a of the first electrode 1 is a mounting surface on which asilicon wafer 6 as a processing object (substrate) is mounted, and islarger in external size than the silicon wafer 6. The silicon wafer 6 isa semiconductor substrate on whose front surface logic circuits areformed. The back surface of the silicon wafer 6 that is opposite to thecircuit formation surface is etched by plasma processing after beingground by mechanical processing. Microcracks that have developed on theback surface of the silicon wafer 6 in the mechanical processing areremoved by the etching.

As shown in FIG. 2, the top surface of the first electrode 3 is dividedinto two areas, that is, an inside area and an outside area, by aboundary line P2 that is distant inward by a prescribed length C from anouter periphery position P1 of the silicon wafer 6 as mounted on thefirst electrode 3. That is, the area inside the boundary line P2 is atop surface central area A where the conductive material (aluminum) isexposed and the area outside the boundary line P2 is a ring-shaped topsurface peripheral area B that surrounds the top surface central area Aand in which the conductive material (aluminum) is covered with aninsulating coating 3 f. The prescribed length C need not always beconstant along the entire circumference and may vary with thecircumferential position.

The insulating coating 3 f is made of a ceramic material such asalumina. As shown in FIG. 1, in a state that the first electrode 3 isprovided in the vacuum chamber 1, part (i.e., an outer peripheralportion) of the insulating coating 3 f is covered with the insulator 5A(also see FIG. 6). With this measure, an outer peripheral portion of thefirst electrode 3 is insulated from plasma that is generated in thedischarging space 2 b, whereby an abnormal discharge is prevented.

As shown in FIG. 2, a protective film 6 a is stuck to the front surface(i.e., the circuit formation surface; drawn as the bottom surface inFIG. 2) of the silicon wafer 6. During plasma processing, the protectivefilm 6 a is opposed to the top surface 3 g of the first electrode 3,that is, the silicon wafer 6 is mounted on the first electrode 3 withits mechanically ground surface up. The protective film 6 is a resinfilm, that is, a film made of an insulative resin such as polyolefin,polyimide, or polyethylene terephthalate and having a thickness of about100 mm. The protective film 6 is stuck to the circuit formation surfaceof the silicon wafer 6 with an adhesive. The protective film 6 beingstuck to of the silicon wafer 6 is an insulating layer on its circuitformation surface (i.e., the front surface), and functions (describerlater) as a dielectric when the silicon wafer 6 is absorbedelectrostatically.

As shown in FIG. 2, the silicon wafer 6 is mounted on the firstelectrode 3 in such a manner that a central portion D and an outerperipheral portion E of the protective film 6 a on the silicon wafer 6are brought into contact with the top surface central area A and theinsulative coating 3 f (located over the top surface peripheral area B),respectively, of the first electrode. In this state, the outerperipheral portion E of the protective film 6 a on the silicon wafer 6that is held by the top surface 3 g of the first electrode 3 coextendswith and is in contact with the insulating coating 3 f in the areabetween the outer periphery position P1 and the boundary line P2.

The silicon wafer 6 is electrostatically absorbed on the top surfacecentral area A by mainly utilizing the central portion D of theprotective film 6 a as a dielectric for electrostatic absorption. Atthis time, even in the outer peripheral area E, an electrostaticabsorption force acts, though slightly, on the silicon wafer 6 via theprotective film 6 a and the insulating coating 3 f. These electrostaticabsorption forces bring the outer peripheral portion E of the protectivefilm 6 a into close contact with the insulating coating 3 f.

In this close contact state, the boundary line P2 which is the outerperiphery of the top surface central area A of the top surface of thefirst electrode 3 in which the conductor is exposed is covered with thesilicon wafer 6 irrespective of variations in the outer diameter of thesilicon wafer 6 and the mounting position of the silicon wafer 6 on thefirst electrode 3. Therefore, the conductor of the first electrode 3 isreliably protected from plasma in the discharging space 2 b. As aresult, an abnormal discharge involving the first electrode 3 can beprevented during plasma discharge and the operation state of the plasmaprocessing apparatus can be stabilized.

As shown in FIG. 2, a number of absorption holes 3 e are formed in thefirst electrode 3 so as to reach its top surface and to communicate witha suction hole 3 c that is formed inside the first electrode 3. Thesuction hole 3 c is connected to a vacuum absorption pump 12 via a gasline switching opening/closing mechanism 11. As shown in FIG. 1, the gasline switching opening/closing mechanism 11 is connected to an N2 gassupply section 13 for supplying a nitrogen gas and a He gas supplysection 14 for supplying a helium gas. The suction hole 3 c can beconnected selectively to the vacuum absorption pump 12, the N2 gassupply section 13, and the He gas supply section 14 by switching the gasline switching opening/closing mechanism 11.

If the vacuum absorption pump 12 is driven in a state that theabsorption hole 3 c communicates with the vacuum absorption pump 12,vacuum suction is effected through the absorption holes 3 e and thesilicon wafer 6 that is mounted on the first electrode 3 isvacuum-absorbed and held. Therefore, the absorption holes 3 e, thesuction hole 3 c, and the vacuum absorption pump 12 constitute a vacuumholding means for holding the silicon wafer 6 by vacuum-absorbing thesilicon wafer 6 through the absorption holes 3 e which are formed in thefirst electrode 3 so as to reach its top surface.

If the suction hole 3 c is connected to the N2 gas supply section 13 orthe He gas supply section 14, a nitrogen gas or a helium gas can beapplied to the bottom surface (as viewed in FIG. 2) of the silicon wafer6 through the absorption holes 3 e. As described later, the nitrogen gasis a blowing gas for forcibly detaching the silicon wafer 6 from themounting surface 3 g and the helium gas is a heat transmission gas withwhich the absorption holes 3 e are charged to accelerate cooling of thesilicon wafer 6 during plasma processing.

A coolant passage 3 d for cooling is formed in the first electrode 3 andis connected to a cooling mechanism 10. If the cooling mechanism 10 isdriven, a coolant such as cooling water circulates through the coolingpassage 3 d, whereby the first electrode 3 and the protective film 6 aon the first electrode 3 whose temperatures are increased by heat thatis generated during plasma processing are cooled. The cooling passage 3d and the cooling mechanism 10 constitute a cooling means for coolingthe first electrode 3.

A vacuum-evacuating section 8 is connected, via a valve openingmechanism 7, to an exhaust port 1 a that communicates with the exhaustspace 2 a in the processing room 2. If the vacuum-evacuating section 8is driven with the valve opening mechanism 7 in an open state, theprocessing room 2 of the vacuum chamber 1 is vacuum-evacuated and thepressure inside the processing room 2 is lowered. The vacuum-evacuatingsection 8 is a pressure lowering means for lowering the pressure insidethe processing room 2 by exhausting the processing room 2 through theexhaust port 1 a which communicates with the exhaust space 2 a.

The first electrode 3 is electrically connected to a radio-frequencypower section 17 via a matching circuit 16. If the radio-frequency powersection 17 is driven, a radio-frequency voltage is applied between thefirst electrode 3 and the second electrode 4 which is electricallycontinuous with the vacuum chamber 1 that is grounded by a groundingportion 19, whereby plasma discharge occurs in the processing room 2.The matching circuit 16 serves for impedance matching between theradio-frequency power section 17 and a plasma discharge circuit forgenerating plasma in the processing room 2. The first electrode 3, thesecond electrode 4, and the radio-frequency power section 17 constitutea plasma generating means for generating plasma for plasma processing ofthe silicon wafer 6 that is mounted on the mounting surface.

An electrostatic absorption DC power section 18 (called “DC powersection” in the claims) is also connected to the first electrode 3 viaan RF filter 15. If the electrostatic absorption DC power section 18 isdriven, negative charge is accumulated in the surface of the firstelectrode 3. If plasma is generated in the processing room 2 in thisstate by driving the radio-frequency power section 17, a DC circuit thatconnects the silicon wafer 6 that is mounted on the first electrode 3 tothe grounding portion 19 via the plasma in the processing room 2,whereby a closed DC circuit that connects the first electrode 3, the RFfilter 15, the electrostatic absorption DC power section 18, thegrounding portion 19, the plasma, and the silicon wafer 6 in this orderis formed. As a result, positive charge is accumulated in the siliconwafer 6.

Coulomb force acts between the negative charge accumulated in the firstelectrode 3 and the positive charge accumulated in the silicon wafer 6,and causes the silicon wafer 6 to be held by the first electrode 3 viathe protective film 6 a that serves as a dielectric. At this time, theRF filter 15 prevents the radio-frequency voltage of the high-frequencypower section 17 from being applied directly to the electrostaticabsorption DC power section 18. The first electrode 3 and theelectrostatic absorption DC power section 18 constitute an electrostaticabsorbing means for causing the first electrode 3 to hold the siliconwafer (plate-like substrate) 6 by electrostatic absorption. The polarityof the electrostatic absorption DC power section 18 may be opposite tothe above-described one.

Next, the structure of the second electrode 4 will be described indetail. The second electrode 4 has the central electrode portion 4 a anda projection portion 4 f that is made of an insulating material andprojects from the outer periphery of the electrode portion 4 a. Having alarger external size than the first electrode 3 does, the projectionportion 4 f extends outside the first electrode 3. A gas blowing-outportion 4 e is provided so as to occupy a central portion of the bottomsurface of the second electrode 4, and supplies a plasma generation gasfor causing plasma discharge in the discharge space 2 b. The gasblowing-out portion 4 e is a member produced by shaping, into a circularplate, a porous material having a number of minute holes inside. The gasblowing-out portion 4 e causes a plasma generation gas that has beensupplied to a gas storage space 4 g to be supplied to the dischargespace 2 b uniformly by blowing out the gas uniformly through the minuteholes.

A gas supply hole 4 c that communicates with the gas storage space 4 gis formed in the support portion 4 b, and is connected to a plasmageneration gas supply section 21 via an opening/closing valve 20. If theplasma generation gas supply section 21 is driven in a state that theopening/closing valve 20 is opened, a plasma generation gas containing afluorine-based gas is supplied to the discharge space 2 b via the gasblowing-out portion 4 e.

A coolant passage 4 d for cooling is formed in the second electrode 4and is connected to the cooling mechanism 10. If the cooling mechanism10 is driven, a coolant such as cooling water circulates through thecooling passage 4 d, whereby the second electrode 4 whose temperature isincreased by heat that is generated during plasma processing is cooled.

As shown in FIG. 3, an opening 1 b for input/output of a processingobject is formed through a side wall of the processing room 2 (also seeFIG. 5). A door 22 that is elevated and lowered by an opening/closingmechanism 23 is provided outside the opening 1 b; the opening 1 b isopened or closed by lowering or elevating the door 22. FIG. 4 shows howthe silicon wafer 6 is input or output in a state that the opening is 1b is opened by lowering the door 22. In a state that a transport spaceis secured over the first electrode 3 by elevating the second electrode4 with the elevation mechanism 24, an absorption head 25 that is held byan arm 25 a is inserted into the processing room 2 through the opening 1b to input or output the silicon wafer 6. In the above-describedconfiguration in which the wide exhaust space 2 a is secured, a longinter-electrode distance can be secured when the second electrode 4 iselevated, which facilitates a manipulation of inputting or outputting aprocessing object.

A plan positional relationship between the processing room 2, the firstelectrode 3, the silicon wafer 6 mounted on the first electrode 3, andthe second electrode 4 will now be described with reference to FIG. 5.In FIG. 5, which is a horizontal sectional view of the vacuum chamber 1,concentric circles represent, in order from the outside, the innersurface 2 c of the processing room 2 (i.e., the vacuum chamber 1), theouter side surface 4 h (see FIG. 6) of the second electrode 4, the outerside surface 3 h of the first electrode 3, the boundary line P1indicating the outer periphery of the silicon wafer 6, and the boundaryline P2 on the top surface of the first electrode 3.

As seen from FIG. 5, since the processing room 2 and the secondelectrode 4 are generally cylindrical, a space S1 that is formed betweenthe inner surface 2 c of the processing chamber 2 and the outer sidesurface 4 h of the second electrode 4 has a generally cylindrical spacethat is interposed between the circumferential surfaces of twoconcentric cylinders except the portion continuous with the opening 1 b.

Next, a description will be made of a gas flow path for guiding a gasoutward from the discharge space 2 b and a gas exhaust path forexhausting the thus-guided gas to the exhaust space 2 a. As shown inFIG. 6, in a state that the second electrode 4 is lowered, the space S1having a generally constant width G1 over the entire circumference ofthe second electrode 4 is formed between the inner surface 2 c of theprocessing chamber 2 (i.e., the vacuum chamber 1) and the side surface 4h of projection portion 4 f of the second electrode 4. The space S1serves as a gas exhaust path for guiding a gas from the discharge space2 a to the exhaust space 2 b.

A space S2 having a generally constant width G2 over the entirecircumference of the second electrode 4 is formed between the bottomsurface of the projection portion 4 f and the top surface of theinsulator 5A that is provided around the first electrode 3. The space S2serves as a gas flow path for guiding outward a gas that is suppliedfrom the bas blowing-out portion 4 e to the discharge space 2 b and areaction gas that is produced by plasma discharge.

The dimensions of the related portions are set so that both of thewidths G1 and G2 become smaller than a maximum dimension H of thedischarge space 2 a in the height direction (see FIG. 3). With thismeasure, the conductance of each of the space S1 as the gas exhaust pathand the space S2 as the gas flow path can be made smaller than theconductance of the exhaust space 2 a (conductance represents the degreeof easiness of gas flow).

In a low-pressure processing room 2, a plasma generation gas assumes amolecular flow in which has molecules have a long mean free path. Inthis molecular flow state, the conductance is irrelevant to the pressureand proportional to the third power of the inter-wall distance of aspace concerned. Therefore, the conductance of each of the spaces S1 andS2 is smaller than the conductance of the exhaust space 2 a to a greaterextent when the widths G1 and G2 are smaller than the dimension H. Thatis, in plasma processing that is performed under a low pressure, a gasflows through the exhaust space 2 a more easily than in through each ofthe spaces S1 and S2.

Therefore, in exhausting a gas from the discharge space 2 b through theexhaust port 1 a during plasma processing, a gas that has entered theexhaust space 2 a from the space S1 is exhausted quickly through theexhaust port 1 a because of the large conductance of the exhaust space 2a; no large variation occurs in the gas flow state distribution in theexhaust space 2 a. As a result, for a gas that is entering the exhaustspace 2 a from the space S1, an almost uniform flow state is attainedover the entire circumference of the second electrode 4. Similarly, fora gas that is entering the space S1 from the space S2, an almost uniformflow state is attained over the entire circumference of the secondelectrode 4. In this manner, the state of a gas in the discharge space 2a is made uniform, whereby the distribution of the degree of etching byplasma processing can also be made uniform.

The configuration of the plasma processing apparatus has been describedabove. A plasma processing method will now be described below withreference to the drawings. Plasma processing is performed in a statethat the silicon wafer 6 to whose front surface the protective film 6 ais stuck as an insulating layer is held by the top surface of the firstelectrode 3 by electrostatic absorption and the first electrode 3 isbeing cooled.

First, the silicon wafer 6 as a processing object is transported intothe processing room 2 and mounted on the first electrode 3. After theopening 1 b is closed, the vacuum absorption pump 12 is driven, wherebythe silicon wafer 6 is vacuum-sucked via the absorption holes 3 e andthe suction hole 3 c; the silicon wafer 6 is held by the top surface 3 gof the first electrode 3 by vacuum absorption in such a manner as to bein close contact with the top surface 3 g.

Then, after the processing room 2 is vacuum-evacuated by driving thevacuum-evacuating section 8, a plasma generation gas is supplied fromthe plasma generation gas supply section 21 to the processing room 2.Then, a DC voltage is applied between the first electrode 3 and thesecond electrode 4 by driving the electrostatic absorption DC powersection 18 and plasma discharge is started by driving theradio-frequency power section 17. As a result, plasma is generated inthe discharge space 2 b and plasma processing is performed on thesilicon wafer 6. During the plasma processing, electrostatic absorptionforce occurs between the first electrode 3 and the silicon wafer 6 andthe silicon wafer 6 is held by the first electrode 3 by theelectrostatic absorption force.

In this electrostatic absorption, as shown in FIG. 2, the silicon wafer6 is placed on the first electrode 3 in such a manner that the centralportion D of the protective film 6 a is in contact with the top surfacecentral area A of the first electrode 3 and the outer peripheral portionE of the former is in contact with the insulating coating 3 f of the topsurface peripheral area B of the latter. The silicon wafer 6 iselectrostatically absorbed on the top surface central area A by mainlyutilizing the central portion D of the protective film 6 a as adielectric for electrostatic absorption. The outer peripheral portion Eof the protective film 6 a is in close contact with the insulatingcoating 3 f, whereby the top surface central area A of the firstelectrode 3 is insulated from plasma.

Then, the gas line switching opening/closing mechanism 11 is driven,whereby the vacuum absorption is stopped and He is applied from behind.Specifically, after the holding of the silicon wafer 6 by the firstelectrode 3 by vacuum absorption is canceled, a helium gas for heatconduction is supplied from the He gas supply section 14 via the suctionhole 3 c to fill the absorption holes 3 e with the helium gas. Duringplasma processing, the first electrode 3 is cooled by the coolingmechanism 10. The heat of the silicon wafer 6 whose temperature isincreased by the plasma processing is transmitted to the first electrode3 via the helium gas that is a highly heat-conductive gas. In thismanner, the silicon wafer 6 can be cooled efficiently.

After a prescribed plasma processing time has elapsed and the dischargehas finished, the backside He application is stopped and vacuumabsorption is started again. As a result, the silicon wafer 6 is held bythe first electrode 3 by vacuum absorption force instead of theelectrostatic absorption force that has disappeared because of the endof the plasma discharge.

Subsequently, the driving of the electrostatic absorption DC powersection 18 is stopped (i.e., the DC voltage is turned off) and anopening-to-air mechanism 9 is driven to open the processing room 2 tothe ambient air. Then, the gas line switching opening/closing mechanism11 is driven again to stop the vacuum absorption. Wafer blowing isperformed thereafter. That is, a nitrogen gas is supplied via thesuction hole 3 c and blown out of the absorption holes 3 e, whereby thesilicon wafer 6 is detached from the first electrode 3. Then, theopening 1 b is opened and the silicon wafer 6 is transported out of theprocessing room 2. Finally, the wafer blowing is stopped to complete theone cycle of plasma processing.

The shapes of the peripheral portion of the first electrode and theinsulating coating are not limited to those of the above embodiment andmay be changed as shown in FIG. 7B. FIG. 7A shows, for comparison, theperipheral portion of the first electrode 3 and the insulating coating 3f of FIGS. 1-6. FIG. 7B shows a first electrode 103 and an insulatingcoating 103 f having modified shapes.

The modified shapes are such that the diameter D3 of the first electrode103 is set smaller than the diameter D2 of the first electrode 3 shownin FIG. 7A and that the top surface of the outer peripheral portion ofthe first electrode 103 is rounded. The insulating coating 103 f isformed in an area outside the same position as the boundary line P2shown in FIG. 7A so as to cover the rounded outer peripheral portion anda top portion of the outer side surface of the first electrode 103. Thisstructure also prevents an abnormal discharge during plasma processingas in the case of FIG. 7A. In addition, since the insulating coating 103f is rounded, they are not prone to cracks.

With the above structure, the diameter D3 of the first electrode 103 canbe made smaller than the diameter D2 of the first electrode 3 shown inFIG. 7A while the above advantages are secured; the first electrode canbe made more compact for silicon wafers having the same diameter D1.This makes it possible to increase the plasma density over the siliconwafer 6 and thereby increase the etching rate even when plasmaprocessing performed with the same radio-frequency output power.Further, the external size B2 of a vacuum chamber 101 can be madesmaller than the external size B1 of the vacuum chamber 1 shown in FIG.7A, which makes the apparatus more compact.

As described above, in the plasma processing apparatus according to theembodiment, the top surface of the first electrode 3 that holds, byelectrostatic absorption, the silicon wafer 6 to which the protectivefilm 6 a is stuck as an insulating layer consists of the top surfacecentral area A in which the conductor is exposed and the ring-shaped topsurface peripheral area B that surrounds the top surface central area Aand in which the conductor is covered with the insulating coating 3 f.

Therefore, when the silicon wafer 6 is held by electrostatic absorption,the silicon wafer 6 can be held by sufficient electrostatic holdingforce by bringing the conductor into direct contact with the siliconwafer 6 in the top surface central area A. And the cooling efficiencycan be increased by bringing the protective film 6 a of the siliconwafer 6 into close contact with the conductor of the first electrode 3.This prevents thermal damage to the silicon wafer 6 and the protectivefilm 6 a, and makes it possible to realize efficient plasma processingexhibiting a high etching rate.

Further, in the above configuration, the peripheral portion of the firstelectrode 3 is covered with the insulating coating 3 f (an abnormaldischarge tends to occur between the peripheral portion and plasma inthe discharge space 2 b) and the related dimensions are set so that theinner periphery of the insulating coating 3 f is necessarily coveredwith the silicon wafer 6. This prevents an abnormal discharge duringplasma processing and thereby realize stable operation of the apparatus.

According to the invention, the top surface of the electrode for holdinga substrate by electrostatic absorption consists of the top surfacecentral area that is inside the boundary line that is distant inward bya prescribed length from the outer periphery of the substrate and inwhich the conductor is exposed, and the ring-shaped top surfaceperipheral area that surrounds the top surface central area and in whichthe conductor is covered with the insulating coating. This structuremakes it possible to hold the substrate by sufficient electrostaticholding force and to increase the cooling efficiency of the substrate bybringing the substrate into close contact with the electrode.

1. A plasma processing apparatus for plasma-processing a surface of asubstrate having an insulating layer on a front surface that isaccommodated in a processing room, comprising: an electrode that is aconductor and has a top surface that is greater in external size thanthe substrate; cooling means for cooling the electrode; a DC powersection for applying a DC voltage to the electrode to cause the topsurface of the electrode to hold the substrate by electrostaticabsorption; pressure lowering means for lowering pressure inside theprocessing room; a plasma generation gas supply section for supplying aplasma generation gas to the processing room; and a radio-frequencypower section for generating plasma in the processing room by applying aradio-frequency voltage to the electrode, wherein the top surface of theelectrode has a top surface central area that is inside a boundary linethat is distant inward by a prescribed length from an outer periphery ofthe substrate and in which the conductor is exposed, and a ring-shapedtop surface peripheral area that surrounds the top surface central areaand in which the conductor is covered with an insulating coating.
 2. Theplasma processing apparatus according to claim 1, wherein an outerperipheral portion of the insulating layer of the substrate being heldby the top surface of the electrode is in contact with the insulatingcoating in an area between the outer periphery and the boundary line. 3.The plasma processing apparatus according to claim 1, comprising aninsulating portion that covers an outer peripheral portion of theinsulating coating in ring form.
 4. The plasma processing apparatusaccording to claim 1, wherein the insulating coating extends to coverpart of a side surface of the electrode.
 5. The plasma processingapparatus according to claim 1, wherein the insulating coating is madeof alumina.